Photolithography – Nano Imprint

AGC’s Nanoimprint Lithography (NIL) is a low-cost method of fabricating nanometer scale patterns. It creates patterns by mechanical deformation of imprint resist and subsequent processes.

AGC’s NIL solutions for LED is specially designed for large scale mass production and includes a replica mold with a first-of-its-kind flexible substrate that is a release agent free process, eliminating the time-consuming process of treatments for release agents.

AGC’s flexible nanoimprint forming (NIF) replica molds fit warped substrates and provide uniform imprints, minimizing defect areas on transferred patterns.